Answer:
Mass of sample is 99.9 g, density of ample is 11.35 
and temperature of sample is 
Explanation:
Mass is an additive property. Therefore mass of combined sample is summation of masses of two pellets.
Mass of combined sample = (37.2+62.7) g = 99.9 g
Density is an intensive property. Therefore density of combined sample of lead will be same as with density of Pb.
Density of combined sample = 11.35
Temperature is an intensive property. Therefore temperature of combined sample of lead will be same as with individual pellets.
temperature of combined sample =
Answer:
The best definition is: "Buffer capacity is the amount of acid or base that can be added to a buffer without destroying its effectiveness"
Explanation:
A buffer is a solution that is somewhat resist to pH changes by reacting with acids and bases that may be added into the solution. It's capacity is the amounto of acid or base that can be added into solution without much change in pH.
So the best definition is: "Buffer capacity is the amount of acid or base that can be added to a buffer without destroying its effectiveness"
Answer:
1.27 moles (3 s.f.)
Explanation:
Mole ratio of water: C6H14
= 14:2
= 7:1
This means that to produce 7 moles of water, 1 mole of C6H14 is needed. Or 1/7 mole of C6H14 is needed to produce 1 mole of water. So if you need 8.86 moles of water, 8.86(1/7) moles of C6H14 is needed.
For 8.86mol of water, moles of C6H14 needed
= 8.86/7
= 1.27 moles (3 s.f.)
Sample means for solutions 1 and 2 are 19.27 and 10.32 respectively
In semiconductor manufacturing,
The total for answer 1 is given by:
9.7+10.5+9.4+10.6+9.3+10.7+9.6+10.4+10.2+10.5 = 192.7
The sample size is 10 and provides us with
192.7/10 = 19.27
For solution 2, the sum is given by:
10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2
The sample size is 10, this gives us
103.2/10 = 10.32
The total for answer 2 is given by:
10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2
The sample size is 10 and provides us with
103.2/10 = 10.32
Learn more about semiconductor manufacturing here brainly.com/question/22779437
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In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and is known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.7 10.6 10.5 10.3 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 Calculate sample means of solution 1 and solution 2
Answer:
Explanation:
endergonic
A chemical reaction that has a positive ΔG is correctly described as A) endergonic.
