Ohm's law defines the relationship between the voltage, current<span>, and </span>resistance<span> in an electric </span>circuit<span>: i = v/r. The </span>current<span> is directly proportional to the voltage and inversely proportional to the </span>resistance<span>.</span>
Answer:
The pressure remains constant
Explanation:
this is an example in charles law where as the temperature increases so does the volume.
In this item, we are simply to find the ions that may bond and are able to form a formula unit. We are also instructed to give out their name. There are numerous possible combinations of ions to form a compound. Some answers are given in the list below.
1. Na⁺ , Cl⁻ , NaCl ---> sodium chloride (this is most commonly known as table salt)
2. C⁴⁺ , O²⁻ , CO₂ ---> carbon dioxide
3. Al³+ , Cl⁻ , AlCl₃ ----> aluminum chloride
4. Ca²⁺ , Cl⁻ , CaCl₂ ---> calcium chloride
5. Li⁺ , Br⁻ , LiBr ---> lithium bromide
6. Mg³⁺ , O²⁻ , Mg₂O₃ ----> magnesium oxide
7. K⁺ , I⁻ , KI ---> potassium iodide
8. H⁺ , Cl⁻ , HCl --> hydrogen chloride
9. H⁺ , Br⁻ , HBr ----> hydrogen bromide
10. Na⁺ , Br⁻ , NaBr ---> sodium bromide
Sample means for solutions 1 and 2 are 19.27 and 10.32 respectively
In semiconductor manufacturing,
The total for answer 1 is given by:
9.7+10.5+9.4+10.6+9.3+10.7+9.6+10.4+10.2+10.5 = 192.7
The sample size is 10 and provides us with
192.7/10 = 19.27
For solution 2, the sum is given by:
10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2
The sample size is 10, this gives us
103.2/10 = 10.32
The total for answer 2 is given by:
10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2
The sample size is 10 and provides us with
103.2/10 = 10.32
Learn more about semiconductor manufacturing here brainly.com/question/22779437
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In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and is known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.7 10.6 10.5 10.3 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 Calculate sample means of solution 1 and solution 2
