3 years ago

A silicon dioxide film formed on the surface of a silicon wafer by thermal oxidation has a thickness that is ____

Engineering

1 answer:

mars1129 [50]3 years ago

3 0

Answer:

less thickness

Explanation:

Thermal oxidation is a process where only the surface atoms react and are converted into the silicon dioxide, so unless you have a layer of silicon wafer of a one atom thickness, the thickness of the silicon dioxide will always be thinner than the silicon wafer.

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