When a substrate is exposed to one more more number of volatile substances that react together on the surface of substrate to produce a suitable deposit of a thin non-volatile film is known as chemical vapor deposition.
This type of reaction generally occurs in heat flux.
Therefore, we can conclude that the statement chemical vapor deposition can be defined as the interaction between a mixture of gases and the surface of a heated substrate, causing chemical decomposition of some of the gas constituents and formation of a solid film on the substrate, is true.
