Give the ground-state electron configuration for silicon (SiSi) using noble-gas shorthand. Express your answer in condensed form
1 answer:
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Answer:
The answer is "Choice A and Choice B"
Explanation:
The Zero-Order reactions are usually found if a substrate, like a surface or even a catalyst, is penetrated also by reactants. Its success rate doesn't depend mostly on the amounts of the various reaction in this reaction.
Let the Rate = k
As doesn't depend on reaction rate, a higher reaction rate does not intensify the reaction.
By the rate the created based and the reaction rate is about the same.
Answer:
Explanation:
At the beginning, you have two reactions happening:
As you add KOH(aq), it does two things:
- It increases the volume of the solution.
- It reacts with the hydronium ions to form water.
A) The HCl is completely ionized. The Cl⁻ does not react, but it is diluted when the volume of the solution increases. [Cl⁻] decreases.
B) The KOH reacts with the H⁺ and removes it from the solution. [H⁺] decreases.
C) When all the H⁺ from the HCl has been neutralized, the KOH starts neutralizing the H⁺ from the HClO₂. According to Le Châtelier's Principle, more HClO₂ will dissociate to replace the decreased H⁺. [HClO₂] decreases.
D) As HClO₂ reacts, it forms ClO₂⁻.