Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silico
n is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
1 answer:
Answer:
The question continues; At this same temperature, how long (total time, in minutes) would it take for oxygen to diffuse to form a 0.13 micron thick layer of SiO2? Assume that the silicon can be treated as a semi-infinite solid with a constant concentration of oxygen at the surface. (Hint: What is true of the oxygen concentration at the Si/SiO2 interface?
Explanation:
The application of Grahams law of diffusion comes in; It states that at constant temperature and pressure, the rate of diffusion of a gas is inversely proportional to the square root of its relative molecular mass or the square root of its density.
The detailed step by step explanayion and application of grahams law is as shown in the attachment.
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Explanation:
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In this case, since the reaction for the formation of ammonia is:
We can evidence the 1:2 mole ratio of nitrogen gas to ammonia; therefore, the appropriate stoichiometric setup for the calculation of the moles of the latter turns out to be:
And the result is:
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