Thin film deposition is a process where: a)-elemental, alloy, or compound thin films are deposited onto a bulk substrate! b)-Pho
1 answer:
You might be interested in
Here is the flow sheet. Hope this helps have a great day!!
Answer:
hello your question is incomplete attached below is the missing part of the question
Consider an inverter operating a power supply voltage VDD. Assume that matched condition for this inverter. Make the necessary assumptions to get to an answer for the following questions.
answer : Nd ∝ rt
Explanation:
Determine how the delay and active power per device will change as the doping density of N- and P-MOSFET increases
Pactive ( active power ) = Efs * F
Pactive =
also note that ; Pactive ∝ Nd2 (
tD = K . since K = constant
Hence : Nd ∝ rt
Answer:
the torque capacity is 30316.369 lb-in
Explanation:
Given data
OD = 9 in
ID = 7 in
coefficient of friction = 0.2
maximum pressure = 1.5 in-kip = 1500 lb
To find out
the torque capacity using the uniform-pressure assumption.
Solution
We know the the torque formula for uniform pressure theory is
torque = 2/3 × × coefficient of friction × maximum pressure ( R³ - r³ ) .....................................1
here R = OD/2 = 4.5 in and r = ID/2 = 3.5 in
now put all these value R, r, coefficient of friction and maximum pressure in equation 1 and we will get here torque
torque = 2/3 × × 0.2 × 1500 ( 4.5³ - 3.5³ )
so the torque = 30316.369 lb-in