The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
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Answer:
lead dioxide,sulfate and lead acid
Answer:
35.7 kg lid we put
Explanation:
given data
temperature = 105 celcius
diameter = 15 cm
Patm = 101 kPa
to find out
How heavy a lid should you put
solution
we know Psaturated from table for temperature is 105 celcius is
Psat = 120.8 kPa
so
area will be here
area =
..................1
here d is diameter
put the value in equation 1
area =
area = 0.01767 m²
so net force is
Fnet = ( Psat - Patm ) × area
Fnet = ( 120.8 - 101 ) × 0.01767
Fnet = 0.3498 KN = 350 N
we know
Fnet = mg
mass = 
mass = 
mass = 35.7 kg
so 35.7 kg lid we put