Answer:
(a) The magnitude of force is 116.6 lb, as exerted by the rod CD
(b) The reaction at A is (-72.7j-38.1k) lb and at B it is (37.5j) lb.
Explanation:
Step by step working is shown in the images attached herewith.
For this given system, the coordinates are the following:
A(0, 0, 0)
B(26, 0, 0)
And the value of angle alpha is 20.95°
Hope that answers the question, have a great day!
Answer:
0.5 kW
Explanation:
The given parameters are;
Volume of tank = 1 m³
Pressure of air entering tank = 1 bar
Temperature of air = 27°C = 300.15 K
Temperature after heating = 477 °C = 750.15 K
V₂ = 1 m³
P₁V₁/T₁ = P₂V₂/T₂
P₁ = P₂
V₁ = T₁×V₂/T₂ = 300.15 * 1 /750.15 = 0.4 m³

For ideal gas,
= 5/2×R = 5/2*0.287 = 0.7175 kJ
PV = NKT
N = PV/(KT) = 100000×1/(750.15×1.38×10⁻²³)
N = 9.66×10²⁴
Number of moles of air = 9.66×10²⁴/(6.02×10²³) = 16.05 moles
The average mass of one mole of air = 28.8 g
Therefore, the total mass = 28.8*16.05 = 462.135 g = 0.46 kg
∴ dQ = 0.46*0.7175*(750.15 - 300.15) = 149.211 kJ
The power input required = The rate of heat transfer = 149.211/(60*5)
The power input required = 0.49737 kW ≈ 0.5 kW.
The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
brainly.com/question/13650094
#SPJ11