The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
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Answer:
D. The maximum velocity decreases with distance from the entrance.
Explanation:
This is because over time, the pressure with with the incompressible liquid enters decreases with distance from the entrance
Complete Question
A force of F =460 lb. acts on the curved member as shown. Determine the resultant normal force across the cross section at point B. Express your answer to three significant figures and include appropriate units.(Figures Attached)
Answer:
Resultant Normal Force = 55. 02 lb.
Explanation:
In Order to find the resultant normal force we must first resolve the figure to find out the x and y components of the force across the cross-section at point B. Hence after resolving the figure we can find the resultant normal force by finding the vertical component of the force: ∑ F_y
The normal force acting at point B will be:
∑ F_y :-
N_F + 460(4/5)sin〖30〗^° - 460(3/5) sin〖60〗^° = 0
N_F + 184 - 239.02 = 0
N_F = 55. 02 lb.