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Arlecino [84]
3 years ago
9

Who is/are the founder/founders of transistor? ​

Engineering
2 answers:
den301095 [7]3 years ago
7 0

Answer:

William Shockley, Walter Houser Brattain and John Bardeen.

Explanation:

It was built in 1947 and they won the novel peace prize in 1956

Ronch [10]3 years ago
6 0

Answer:

  • William Shockley
  • John Bardeen
  • Walter Houser Brattain

Explanation:

hope this helps you!

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4.68 Steam enters a turbine in a vapor power plant operating at steady state at 560°C, 80 bar, and exits as a saturated vapor at
garik1379 [7]

Answer:

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Explanation:

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2 years ago
What is the built-in pollution control system in an incinerator called
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Explanation:

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2 years ago
A hydraulic jump is induced in an 80 ft wide channel.The water depths on either side of the jump are 1 ft and 10 ft.Please calcu
krek1111 [17]

Answer:

a) 42.08 ft/sec

b) 3366.33 ft³/sec

c) 0.235

d) 18.225 ft

e) 3.80 ft

Explanation:

Given:

b = 80ft

y1 = 1 ft

y2 = 10ft

a) Let's take the formula:

\frac{y2}{y1} = \frac{1}{5} * \sqrt{1 + 8f^2 - 1}

10*2 = \sqrt{1 + 8f^2 - 1

1 + 8f² = (20+1)²

= 8f² = 440

f² = 55

f = 7.416

For velocity of the faster moving flow, we have :

\frac{V_1}{\sqrt{g*y_1}} = 7.416

V_1 = 7.416 *\sqrt{32.2*1}

V1 = 42.08 ft/sec

b) the flow rate will be calculated as

Q = VA

VA = V1 * b *y1

= 42.08 * 80 * 1

= 3366.66 ft³/sec

c) The Froude number of the sub-critical flow.

V2.A2 = 3366.66

Where A2 = 80ft * 10ft

Solving for V2, we have:

V_2 = \frac{3666.66}{80*10}

= 4.208 ft/sec

Froude number, F2 =

\frac{V_2}{g*y_2} = \frac{4.208}{32.2*10}

F2 = 0.235

d) El = \frac{(y_2 - y_1)^3}{4*y_1*y_2}

El = \frac{(10-1)^3}{4*1*10}

= \frac{9^3}{40}

= 18.225ft

e) for critical depth, we use :

y_c = [\frac{(\frac{3366.66}{80})^2}{32.2}]^1^/^3

= 3.80 ft

7 0
3 years ago
Read 2 more answers
Reasons for racking back on a wall
zmey [24]

Answer:

Racking is the term used for when buildings tilt as their structural components are forced out of plumb. This is most commonly caused by wind forces exerting horizontal pressure, but it can also be caused by seismic stress, thermal expansion or contraction, and so on.

Explanation:

3 0
3 years ago
Consider a N-channel enhancement MOSFET with VGS = 3V, Vt = 1 V, VDS = 10 V, and lambda =0 (channel length modulation parameter)
AveGali [126]

The current IDS is greater than 0 since the VGS has induced an inversion layer and the transistor is operating in the saturation region.

<u>Explanation:</u>

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  • By the saturation region the MOSFET is operating.
  • A specific source voltage and gate of NMOS, the voltage get drained during the specific level, the drain voltage is rises beyond where there is no effect of current during saturated region.
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  • The core of this is integrated circuit.
  • It is fabricated and designed in an individual chips due to tiny sizes.
7 0
3 years ago
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