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Natasha_Volkova [10]
4 years ago
5

For the chemical reaction:

Chemistry
1 answer:
Kamila [148]4 years ago
7 0

Answer:

Volume of ammonia produced = 398.7 dm³

Explanation:

Given data:

Volume of N₂ = 200 dm³

Pressure and temperature = standard

Volume of ammonia produced = ?

Solution:

Chemical equation:

N₂ + 3H₂     →      2NH₃

Number of moles of N₂:

PV = nRT

1 atm× 200 L = n× 0.0821 atm.L/mol.K × 273 K

n = 200 atm.L /22.41 atm.L/mol

n = 8.9 mol

Now we will compare the moles of ammonia and nitrogen.

               N₂          :         NH₃

                1            :           2

              8.9          :        2/1×8.9 = 17.8 mol

Volume of ammonia:

1 mole of any gas occupy 22.4 dm³ volume

17.8 mol ×22.4 dm³/1 mol = 398.7 dm³

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Answer:

Will group 2 elements lose electrons to bond with nonmetals in group 17 in a

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Explanation:

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Elements of group 2 have a valency of 2 while those of group 17 has a valency of 1 so the ratio in which group 2 elements bond with elements of group 17 is 1:2. Hence the answer.

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If an object has a density more then 1 g/m0, what will happen when its placed in water?
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In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalliza
Reptile [31]

Sample means for solutions 1 and 2 are 19.27 and 10.32 respectively

In semiconductor manufacturing,

The total for answer 1 is given by:

9.7+10.5+9.4+10.6+9.3+10.7+9.6+10.4+10.2+10.5 = 192.7

The sample size is 10 and provides us with

192.7/10 = 19.27

For solution 2, the sum is given by:

10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2

The sample size is 10, this gives us

103.2/10 = 10.32

The total for answer 2 is given by:

10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2

The sample size is 10 and provides us with

103.2/10 = 10.32

Learn more about semiconductor manufacturing here brainly.com/question/22779437

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In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and is known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.7 10.6 10.5 10.3 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 Calculate sample means of solution 1 and solution 2

4 0
1 year ago
What is the name of the event ,which created the universe ?
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5 0
4 years ago
Consider: CO(g) + Cl2 (g) ⇌ COCl2 (g) Kc = 1.2×103 at 395 °C. If the equilibrium concentrations of Cl2 and COCl2 are the same at
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Answer : The equilibrium concentration of CO in the reaction is, 8.3\times 10^{-4}M

Explanation :

The given chemical reaction is:

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As we are given:

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So,

K_c=\frac{[Cl_2]}{[CO][Cl_2]}

K_c=\frac{1}{[CO]}

1.2\times 10^3=\frac{1}{[CO]}

[CO]=8.3\times 10^{-4}M

Therefore, the equilibrium concentration of CO in the reaction is, 8.3\times 10^{-4}M

4 0
4 years ago
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