Answer:
λ = 5.85 x 10⁻⁷ m = 585 nm
f = 5.13 x 10¹⁴ Hz
Explanation:
We will use Young's Double Slit Experiment's Formula here:
where,
λ = wavelength = ?
Y = Fringe Spacing = 6.5 cm = 0.065 m
d = slit separation = 0.048 mm = 4.8 x 10⁻⁵ m
L = screen distance = 5 m
Therefore,
<u>λ = 5.85 x 10⁻⁷ m = 585 nm</u>
Now, the frequency can be given as:
where,
f = frequency = ?
c = speed of light = 3 x 10⁸ m/s
Therefore,
<u>f = 5.13 x 10¹⁴ Hz</u>
To find the electron and hole concentrations and fermi levels in silicon at 300 k for boron, fermi level is 9.3 x .
Ionization energy for boron in Si, 0.045 eV
Fermi level in silicon,
300 K at (Boron atoms)
All boron impurities are ionized, 300K
Electron, hole concentrations and Fermi levels is found out,
The value of Na =
np =
np =
np= 9.3 x
Fermi level is calculated,
Ef - Ev = kT ln(NV/ND)
value of kT = 0.0259 eV (300° K)
So, substitution the values
Ef - Ev = kT ln(NV/ND)
Ef - Ev = 0.0259ln (2.66 x )
Ef - Ev = 0.0259ln (26600)
Ef - Ev = 0.0259 x 10.18
Ef - Ev = 0.263 eV
What is ionization energy?
Ionization energy, also known as ionization energy (IE) or ionization energy (British English spelling), is the minimal amount of energy needed to free the most loosely bonded electron from an isolated gaseous atom, positive ion, or molecule in physics and chemistry.
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