Answer:
Waterfall model
Explanation:
The waterfall model is amenable to the projects. It focused on the data structure. The software architecture and detail about the procedure. It will interfere with the procedure. It interfaces with the characterization of the objects. The waterfall model is the first model that is introduced first. This model also called a linear sequential life cycle model.
The waterfall model is very easy to use. This is the earliest approach of the SDLC.
There are different phase of the waterfall:
- Requirement analysis
- System Design
- Implementation
- Testing
- Deployment
- Maintenance
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The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
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Answer:
<em>hello your question is incomplete attached below is the missing diagram </em>
answer : 7.87 KN
Explanation:
The magnitude of the resultant force = 7.87 KN
from fig 1
First step :
calculate the resultant force along the x- direction
Frx = ∑Fx = +8 kN - Fcos45° - 14cos 30°
= -4.1243 - 0.7071 F
next :
calculate the resultant force along the y- direction
Fry = ∑Fy = -Fsin45° + 14sin30°
= -0.7071 F + 7
attached below is the remaining part of the detailed solution
Answer:
I think this answer is number B
Answer: When walking with a sharp tool, the tool should be carried with the blade down and away from the body. When climbing with a sharp tool, tool belts, or buckets with hand lines should be used so workers can have both hands to grip the ladder.
Explanation: