Answer:
Time =t2=58.4 h
Explanation:
Since temperature is the same hence using condition
x^2/Dt=constant
where t is the time as temperature so D also remains constant
hence
x^2/t=constant
2.3^2/11=5.3^2/t2
time=t^2=58.4 h
Answer:
L = 475.718
T = 240.89 ft
M = 23.0195
LC = 472.728
R = 1225 ft
Explanation:
See the attached file for the calculation.
The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
brainly.com/question/13650094
#SPJ11
Answer:
Explanation:
Given conditions
1)The stress on the blade is 100 MPa
2)The yield strength of the blade is 175 MPa
3)The Young’s modulus for the blade is 50 GPa
4)The strain contributed by the primary creep regime (not including the initial elastic strain) was 0.25 % or 0.0025 strain, and this strain was realized in the first 4 hours.
5)The temperature of the blade is 800°C.
6)The formula for the creep rate in the steady-state regime is dε /dt = 1 x 10-5 σ4 exp (-2 eV/kT)
where: dε /dt is in cm/cm-hr σ is in MPa T is in Kelvink = 8.62 x 10-5 eV/K
Young Modulus, E = Stress,
/Strain, ∈
initial Strain, 


creep rate in the steady state


but Tinitial = 0


solving the above equation,
we get
Tfinal = 2459.82 hr
Harmonic excitation refers to a sinusoidal external force of a certain frequency applied to a system. ... Resonance occurs when the external excitation has the same frequency as the natural frequency of the system. It leads to large displacements and can cause a system to exceed its elastic range and fail structurally.