Answer:
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The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
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Answer:
B. The thickness of the heated region near the plate is increasing.
Explanation:
First we know that, a boundary layer is the layer of fluid in the immediate vicinity of a bounding surface where the effects of viscosity are significant. The fluid is often slower due to the effects of viscosity. Advection i.e the transfer of heat by the flow of liquid becomes less since the flow is slower, thereby the local heat transfer coefficient decreases.
From law of conduction, we observe that heat transfer rate will decrease based on a smaller rate of temperature, the thickness therefore increases while the local heat transfer coefficient decreases with distance.
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