Answer:
c) Strain
Explanation:
For example, the shear strain “γ” on the surface of the rod is determined by measuring the relative angle of twist “φg” over a gage length “Lg”.
Answer:
Tc = = 424.85 K
Explanation:
Data given:
D = 60 mm = 0.06 m
![\rho = 8000 kg/m^3](https://tex.z-dn.net/?f=%5Crho%20%3D%208000%20kg%2Fm%5E3)
k = 50 w/m . k
c = 500 j/kg.k
![h_{\infty} = 1000 w/m^2](https://tex.z-dn.net/?f=h_%7B%5Cinfty%7D%20%3D%201000%20w%2Fm%5E2)
![t_{\infity} = 750 k](https://tex.z-dn.net/?f=t_%7B%5Cinfity%7D%20%3D%20750%20k)
![t_w = 500 K](https://tex.z-dn.net/?f=t_w%20%3D%20500%20K)
![surface area = As = \pi dL](https://tex.z-dn.net/?f=surface%20area%20%3D%20As%20%3D%20%5Cpi%20dL%20)
![\frac{As}{L} = \pi D = \pi \timeS 0.06](https://tex.z-dn.net/?f=%5Cfrac%7BAs%7D%7BL%7D%20%3D%20%5Cpi%20D%20%3D%20%5Cpi%20%5CtimeS%200.06)
HEAT FLOW Q is
![Q = h_{\infty} As (T_[\infty} - Tw)](https://tex.z-dn.net/?f=Q%20%3D%20h_%7B%5Cinfty%7D%20As%20%28T_%5B%5Cinfty%7D%20-%20Tw%29)
![= 1000 \pi\times 0.06 (750-500)](https://tex.z-dn.net/?f=%20%3D%201000%20%5Cpi%5Ctimes%200.06%20%28750-500%29)
= 47123.88 w per unit length of rod
volumetric heat rate
![q = \frac{Q}{LAs}](https://tex.z-dn.net/?f=q%20%3D%20%5Cfrac%7BQ%7D%7BLAs%7D)
![= \frac{47123.88}{\frac{\pi}{4} D^2 \times 1}](https://tex.z-dn.net/?f=%3D%20%5Cfrac%7B47123.88%7D%7B%5Cfrac%7B%5Cpi%7D%7B4%7D%20D%5E2%20%5Ctimes%201%7D)
![q = 1.66\times 10^{7} w/m^3](https://tex.z-dn.net/?f=q%20%3D%201.66%5Ctimes%2010%5E%7B7%7D%20w%2Fm%5E3)
![Tc = \frac{- qR^2}{4K} + Tw](https://tex.z-dn.net/?f=Tc%20%3D%20%5Cfrac%7B-%20qR%5E2%7D%7B4K%7D%20%2B%20Tw)
![= \frac{ - 1.67\times 10^7 \times (\frac{0.06}{2})^2}{4\times 56} + 500](https://tex.z-dn.net/?f=%3D%20%5Cfrac%7B%20-%201.67%5Ctimes%2010%5E7%20%5Ctimes%20%28%5Cfrac%7B0.06%7D%7B2%7D%29%5E2%7D%7B4%5Ctimes%2056%7D%20%2B%20%20500)
= 424.85 K
It’s 50 percent 99 percent sure
Answer:
A. N type impurities
B. P type impurities
Explanation:
A. The impurities contribute free electrons and changing the conducting property of the semi conductor. When a pentavalent impurities in a semi conductor( impurities with five valence electron) , the impurity atom replace some of the semi conductor atoms in the crystal structure where 4 of the valence electron would be involved in bonding of 4 neighbouring semiconductor while leaving the fifth electron to be free(negative charge carrier) which is available for detachment.
B. When a trivalence impurity is added to semiconductor, instead of excess electron, there will be excess hole created by crystals. Reason for this attribute is the trivalence atom will replace some tetra valence semiconductor atom, when three valence electrons of the 3 valence electrons of the trivalent impurity atom make bond with three neighbouring semiconductor which gives rise to lack of electron in the bond of the fourth neighbouring semiconductor which contribute a whole to the crystalline since trivalent impurity contribute excess holes to the crystal of semi conductor, this holes can accept electrons.
Answer:
The answer is below
Explanation:
a) The work done is equal to the loss in kinetic energy (KE)
Change in kinetic energy (ΔKE) = Final kinetic energy - initial kinetic energy
Final KE = ![\frac{1}{2}mv_f^2](https://tex.z-dn.net/?f=%5Cfrac%7B1%7D%7B2%7Dmv_f%5E2)
But the final velocity is 0 (at rest). Hence:
Final KE = ![\frac{1}{2}mv_f^2=\frac{1}{2}m(0)^2=0](https://tex.z-dn.net/?f=%5Cfrac%7B1%7D%7B2%7Dmv_f%5E2%3D%5Cfrac%7B1%7D%7B2%7Dm%280%29%5E2%3D0)
ΔKE = 0 - K = -K
W = ΔKE = -K
Also, the work done (W) = charge (q) * distance (d) * electric field intensity (E)
W = qEd
but q = -e, hence:
W = -e * E * d
Using:
W = ΔKE
-e * E * d = -K
E= K / (e * d)
b) The electric field is in the direction of the electrons motion