Answer:
Explanation:
volume of 20.9 N
= 20.9 / 11.5 m³
= 1.8174 m³
In one hour 1.8174 m³ flows
in one second volume flowing = 1.8174 / 60 x 60
= 5 x 10⁻⁴ m³
Rate of volume flow = 5 x 10⁻⁴ m³ / s .
Answer:
V = 0.5 m/s
Explanation:
given data:
width of channel = 4 m
depth of channel = 2 m
mass flow rate = 4000 kg/s = 4 m3/s
we know that mass flow rate is given as
Putting all the value to get the velocity of the flow
V = 0.5 m/s
A 3-D model can be communicated, and can also be a visual model.
Answer:
90 degrees
Explanation:
In the case when the sheer stress acts in the one plane of an element so it should be equal and opposite also the shear stress acted on a plan i.e. 90 degrees from the plane
Therefore as per the given situation it should be 90 degrees from the plane
hence, the same is to be considered and relevant too
The three exposure techniques in photolithography are:
- Contact
- Proximity
- Projection
Alternatives to photolithography in IC processing include;
- X-ray
- UV
- Ion, and
- Electron lithography
<h3>
What is Photolithography?</h3>
Photolithography is a term in integrated circuit development that describes the patterned films that are formed when a beam of light falls on a substance.
This phenomenon protects the surface of sensitive materials such as glass during some operations like etching. UV and X-rays can be used for this purpose.
Learn more about photolithography here:
brainly.com/question/13650094
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